International Conference on Nanofabrication Techniques and Engineering Applications (ICNTEEA - 26)

This track focuses on the latest developments in electron beam lithography techniques, emphasizing their applications in nanoscale patterning. Participants will explore innovations that enhance resolution, throughput, and process efficiency.

This session will delve into the applications of focused ion beam technology for precise material modification and nanoscale fabrication. Discussions will include advancements in ion beam optics and their implications for nanostructure engineering.

This track highlights recent breakthroughs in nanoimprint lithography, focusing on new materials and processes that improve replication fidelity. Participants will discuss the scalability of these techniques for industrial applications.

This session will cover the evolution of photolithography techniques and their critical role in micro/nano fabrication. Emphasis will be placed on novel photoresist materials and exposure strategies that enhance pattern resolution.

This track explores the principles and applications of self-assembly methods in creating complex nanostructures. Participants will discuss the integration of self-assembly techniques with traditional fabrication methods.

This session focuses on the advancements in maskless lithography techniques, highlighting their advantages in flexibility and rapid prototyping. Discussions will include the integration of digital approaches in nanofabrication workflows.